s3g-dsp

Ambi Effect Pitch

s3g Ambi Effect Pitch 64 applies order-adaptive pitch processing to complete first- through seventh-order ACN/SN3D fields. It decodes the field to twelve, twenty, or twenty-four listener pickups, applies an independently related dual-grain pitch shift at every point, routes that field through the selected topology, then re-encodes only the correction.

Ambi Effect Pitch on a 3OA DODECA 20 body with varied pitch relationships and an enabled directional wet mask.

Workflow

  1. Insert s3g Ambi Effect Pitch 64 on a correctly routed Ambisonic track after the encoder or encoded source and match ORDER to the field.
  2. Follow it with an ambisonic decoder. Additional Ambisonic effects may be placed before the decoder when their supported order and channel count match the field.
  3. Choose a listener body and begin with neutral spread, deviation, and local trims.
  4. Set the common pitch interval and window, then introduce pickup relationships, topology movement, or a directional mask while listening.

Body and Pitch Model

AUTO uses ICOSA 12 for 1OA-2OA, DODECA 20 for 3OA, and SPHERE 24 for 4OA-7OA. All three bodies can also be selected directly at every order. PCH sets the common interval from -24 to +24 st; WIN controls the dual-reader grain window, and GLD smooths ratio changes.

Macro Relationships

SPRD creates an ordered interval fan across the active body, while DEV adds a stable irregular offset. Each of the twenty-four persistent pickup slots also has a pitch trim and window trim. At zero spread, deviation, interval, and local trims, the pitch path is an exact neutral bypass.

Listener View

Small pickup glyphs sit inside radial -60 dB input-energy envelopes. A short relationship ray at each point shows its effective interval after global macro controls and local trim. Selecting a pickup highlights how that point is heard in LOCAL, CROSS, DIFFUSE, or ROAMING mode and opens the pitch and window rails. TOP, SIDE, and 3/4 provide standard views; drag blank field space to orbit.

Directional Mask

MASK, AZ, EL, WIDTH, and CURVE place the pitch effect in one region. DRY attenuates the complementary region down to -100% FX ONLY. Use a fully wet MIX when the unmasked part of the encoded field should be removed from the correction subspace.